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Production of Low Electron Temperature Plasma and Coating of Carbon-Related Water-Repellent Films on Plastic Plate

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2 Author(s)
Ohtsu, Yasunori ; Dept. of Electr. & Electron. Eng., Saga Univ., Saga, Japan ; Kihara, K.

Low electron temperature plasma with a value less than 2 eV was produced by the inductively coupled discharge with a three-turn spiral antenna and the radio-frequency-biased grid for hard coating of carbon-related water-repellent thin films on plastic plate. It was found that the electron temperature decreased with increasing a negative biasing voltage VG for VG <; -100 V and, then, electron population becomes bicomponent with the higher temperature of about 10 eV and the lower temperature of less than 2 eV. The water-repellent thin films were also prepared on polycarbonate and silicon wafer substrates in the low electron temperature plasma using C2H2F2 and Ar mixture gases. The wetting contact angle and the pencil hardness were discussed.

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Plasma Science, IEEE Transactions on  (Volume:40 ,  Issue: 7 )