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Annealing effect of surface magnetic properties in amorphous Co1-xTix thin films

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6 Author(s)
Y. Y. Kim ; Dept. of Phys., Korea Univ., Chochiwon, South Korea ; J. S. Baek ; S. J. Lee ; W. Y. Lim
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For amorphous Co1-xTix (x=0.13, 0.16, 0.21 at.%) thin films, deposited by the DC magnetron sputtering method, ferromagnetic resonance experiments have been used to investigate the dependence of surface magnetic properties in relation to annealing temperatures (150~225°C). Spin wave resonance spectra for all annealing temperatures consist of several volume modes and one (or two) surface mode. It is suggested that both surfaces of the film have a perpendicular hard axis to the film plane (negative surface anisotropy). Also, the surface anisotropy Ks2 at the substrate-film interface is varied slowly from -0.11 to -0.25 erg/cm2 and the surface anisotropy Ks1 at the film-air interface is varied from 0.16 to -0.53 erg/cm2 with increasing annealing temperatures. We conjecture that the variation of surface anisotropy K s1 is due to the increase of Co concentration resulting from Ti oxidation for low temperature annealing (150-200°C) and the diffusion of Co atoms near the film surfaces for high temperature annealing (225-250°C)

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IEEE Transactions on Magnetics  (Volume:33 ,  Issue: 5 )