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Plasma-enhanced chemical vapor deposition (PECVD) offers a simple way of fabricating (doped) silica layers on silicon. A new design of the waveguide core allows low-loss fiber matched waveguides with low birefringence without high-temperature annealing. The increased loss of doped plasma deposited silica due to hydrogen incorporation is overcome by reducing the core dimensions and increasing the refractive index contrast. The waveguides can easily be fabricated using standard PECVD technologies and resist masked reactive ion etching (RIE) etching. Integrated optical devices such as 1/spl times/8 power splitters, 1300/1550-nm wavelength multiplexers and thermooptical switches were successfully fabricated and tested.