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Study of the photosensitivity at 193 nm and comparison with photosensitivity at 240 nm influence of fiber tension: type IIa aging

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2 Author(s)
Riant, I. ; Alcatel Alsthom Recherche, Marcoussis, France ; Haller, F.

The photosensitivity in germanosilicate fibers at 193 nm is studied and compared with that at 240 nm. As previously shown, it is found that, without hydrogen sensitization, the initiation of the phenomenon is a one-photon process for a high germanium content fiber and a two-photon process for a low germanium content fiber. However, when the low germanium content fiber is previously loaded with hydrogen, it is observed that the photo-induced index change initial growth rate varies linearly with the fluence, invoking a one-photon process. It is shown that external strains applied to the fiber strongly influence the mechanisms of the photosensitivity at 193 nm. Finally, an aging study is carried out

Published in:

Lightwave Technology, Journal of  (Volume:15 ,  Issue: 8 )

Date of Publication:

Aug 1997

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