Close category search window
 

Few electron double quantum dot in an isotopically purified 28Si quantum well

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

8 Author(s)
Wild, A. ; Walter Schottky Institut and Physics Department, Technische Universität München, Am Coulombwall 4, 85748 Garching, Germany ; Kierig, J. ; Sailer, J. ; Ager, J.W.
more authors

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.3701588 

We present a few electron double quantum dot device defined in an isotopically purified 28Si quantum well (QW). An electron mobility of 5.5·104cm2(Vs)-1 is observed in the QW, which is the highest mobility ever reported for a two-dimensional electron system in 28Si. The residual concentration of 29Si nuclei in the 28Si QW is lower than 103ppm, at the verge where the hyperfine interaction is theoretically no longer expected to dominantly limit the T2 spin dephasing time. We also demonstrate a complete suppression of hysteretic gate behavior and charge noise using a negatively biased global top gate.

Published in:
Applied Physics Letters  (Volume:100 ,  Issue: 14 )

Date of Publication: Apr 2012

Need Help?


IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2013 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.