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Study on magneto-optical TbFeCo thin films magnetron-sputtered from targets with low and high magnetic permeabilities

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6 Author(s)
Ahn, Y.M. ; DVD R&D Team, Samsung Electron. Co. Ltd., Kyungki, South Korea ; Cho, B.I. ; Ro, M.D. ; Yoon, D.S.
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We investigated the influence of the magnetic permeabilities of the magneto-optical (MO) tertiary TbFeCo targets. Films were sputter-deposited by using a magnetron rf-dc sputtering system. Target B with a low magnetic permeability (5) was found favorable with regard to the target use efficiency (35%), and the uniform film thickness in the range of 1975 Å to 2015 Å over a substrate of 130 mn in diameter, compared to Target A with a high magnetic permeability (40). The difference of the Tb content between the sputtered thin films and Target B was found narrower than that of the Tb content between the sputtered thin films and Target A. A low motor current was needed to rotate the magnet placed below Target B during the magnetron-sputtering

Published in:
Magnetics, IEEE Transactions on  (Volume:33 ,  Issue: 5 )

Date of Publication: Sep 1997

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