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Process and characterization of nitrogenated carbon

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3 Author(s)
Yang, Ming M. ; HMT Technol. Corp., Fremont, CA, USA ; Chao, James L. ; Russak, Michael A.

Nitrogenated carbon films prepared in a DC-magnetron sputtering system were studied. Properties, including deposition rate, nitrogen content, nano-hardness, and thin film stress, were investigated as a function of deposition conditions, i.e. sputter power, substrate bias, substrate temperature, and sputter pressure

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Magnetics, IEEE Transactions on  (Volume:33 ,  Issue: 5 )