Preparation and magnetic properties of Fe-Ti-N thin films

In this paper the dependence of the magnetic properties of Fe-Ti-N thin films on partial nitrogen pressure (P
_N2
/P
_Total
) during sputtering were studied. Fe-Ti-N thin films were prepared with a dc magnetron reactive sputtering apparatus, using a composite type of target in Ar and N
₂
mixed gas. The crystal structure and magnetic properties of the films were investigated. A single α-Fe (110) peak appeared at various partial nitrogen pressure (P
_N2
/P
_Total
). When PN,sub>2/P
_Total
was increased, the width of α-Fe (110) peak became broader. The α-Fe (110) peak shifted to lower angle direction, and the maximum value of the lattice constant was about 2.93 Å at P
_N2
/P
_Total
in the range of 2.5 ~ 5 %. The value of coercivity (Hc) was 26 Oe, and the value of the saturation magnetization (Ms) was about 1400 emu/cc at P
_N2
/P
_Total
of 0 %. The minimum value of Hc was 2.4 Oe at easy magnetization direction, and 1.35 Oe at hard magnetization direction at P
_N2
/P
_Total
of 2.5 %. The Ms of films increased at P
_N2
/P
_Total
in the range of 2 ~ 5 %. Soft magnetic properties were obtained at P
_N2
/P
_Total
of 2.5 %.