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Preparation and magnetic properties of Fe-Ti-N thin films

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4 Author(s)
Matsumoto, M. ; Dept. of Inf. Eng., Shinshu Univ., Nagano, Japan ; Morisako, A. ; Takei, S. ; Mutou, Y.

In this paper the dependence of the magnetic properties of Fe-Ti-N thin films on partial nitrogen pressure (PN2/PTotal) during sputtering were studied. Fe-Ti-N thin films were prepared with a dc magnetron reactive sputtering apparatus, using a composite type of target in Ar and N2 mixed gas. The crystal structure and magnetic properties of the films were investigated. A single α-Fe (110) peak appeared at various partial nitrogen pressure (PN2/PTotal). When PN,sub>2/PTotal was increased, the width of α-Fe (110) peak became broader. The α-Fe (110) peak shifted to lower angle direction, and the maximum value of the lattice constant was about 2.93 Å at PN2/PTotal in the range of 2.5 ~ 5 %. The value of coercivity (Hc) was 26 Oe, and the value of the saturation magnetization (Ms) was about 1400 emu/cc at PN2/PTotal of 0 %. The minimum value of Hc was 2.4 Oe at easy magnetization direction, and 1.35 Oe at hard magnetization direction at PN2/PTotal of 2.5 %. The Ms of films increased at PN2/PTotal in the range of 2 ~ 5 %. Soft magnetic properties were obtained at PN2/PTotal of 2.5 %.

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Magnetics, IEEE Transactions on  (Volume:33 ,  Issue: 5 )