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UV capillary force lithography for multiscale structures

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6 Author(s)
Hansen, M. ; Nanoelektronik, Technische Fakultät Kiel, Christian-Albrechts-Universität Kiel, D- 24143 Kiel, Germany ; Ziegler, M. ; Kohlstedt, H. ; Pradana, A.
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Rapid advances in information technology rely on novel patterning techniques. The authors present a simple UV capillary force lithography process, which allows one to imprint a multiscale system, consisting of 250 nm wide nanobridges and a 8–20 μm wide wiring in one lithography step. An additional annealing step for 5 min at 75 °C improved the capillary rise.

Published in:

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures  (Volume:30 ,  Issue: 3 )