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Current Control in the Magnetron Systems for Nanofabrication: A Comparison

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6 Author(s)
Yick, S. ; CSIRO Mater. Sci. & Eng., Plasma Nanosci. Centre Australia, Lindfield, NSW, Australia ; Levchenko, I. ; Kumar, S. ; Han, Z.J.
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A cylindrical magnetron system and a hybrid inductively coupled plasma-assisted magnetron deposition system were examined experimentally in light of their discharge characteristics with a view to stress the enhanced controllability of the hybrid system. The comparative study has shown that the hybrid magnetron the inductively coupled plasma system is a flexible, powerful, and convenient tool that has certain advantages as compared with the cylindrical dc magnetrons. In particular, the hybrid system features more linear current-voltage characteristics and the possibility of a bias-independent control of the discharge current.

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Plasma Science, IEEE Transactions on  (Volume:40 ,  Issue: 4 )