Time-of-flight-photoelectron emission microscopy on plasmonic structures using attosecond extreme ultraviolet pulses

We report on the imaging of plasmonic structures by time-of-flight-photoemission electron microscopy (ToF-PEEM) in combination with extreme ultraviolet (XUV) attosecond pulses from a high harmonic generation source. Characterization of lithographically fabricated Au structures using these ultrashort XUV pulses by ToF-PEEM shows a spatial resolution of ∼200 nm. Energy-filtered imaging of the secondary electrons resulting in reduced chromatic aberrations as well as microspectroscopic identification of core and valence band electronic states have been successfully proven. We also find that the fast valence band electrons are not influenced by space charge effects, which is essentially important for attosecond nanoplasmonic-field microscopy realization.