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A generalized methodology for the rigorous characterization of metafilms/metasurfaces through a set of electric and magnetic surface susceptibilities is presented in this paper. According to the novel formulation, the particle polarizabilities of the metafilm are extracted from the S-parameters of a normally incident plane wave and are efficiently related to the corresponding surface susceptibilities. Then, the resulting model is employed for the determination of the scattering parameters for obliquely incident waves. Numerical simulations of diverse metamaterial unit cells are performed to validate the proposed scheme and reveal its accuracy and applicability merits.