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On-current limitation of high-k gate insulator MOSFETs

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7 Author(s)
Chun-Hsing Shih ; Department of Electrical Engineering, National Chi Nan University, Taiwan ; Jhong-Sheng Wang ; Nguyen Dang Chien ; Ruei-Kai Shia
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This work explores the limitation of high-k gate insulator on improving the driving currents of MOSFETs. The use of high-k gate dielectric prevents from the gate tunneling current to have an acceptable EOT thickness in scaled devices. However, the effectiveness of continued EOT reduction is limited by the non-scalability of the quantum effect of inversion layer thickness. Both classical and quantum-mechanical approaches are expressed to describe the physical gate capacitances and the on-state drain currents for studying the influence of invariant inversion layer thickness.

Published in:

Semiconductor Device Research Symposium (ISDRS), 2011 International

Date of Conference:

7-9 Dec. 2011