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This paper describes the influence of ballast-resistor and field-screening on the electron field-emission behavior of nanodiamond emitter arrays fabricated on micropatterned silicon pillars. Arrays of 50 × 50 silicon pillars capped with nanodiamond with different ballast resistances and pillar separations have been fabricated on different silicon substrates as cathode for field emission testing. The goal of this study is to evaluate the fabrication method and electron emission characteristics in this configuration for field emission applications. The electron field emission results have been compared to observe the effect of the ballast resistive behavior and array spacing of micropatterned silicon pillars on the nanodiamond field emission behaviors.