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A new single-poly flash memory cell with low-voltage and low-power operations for embedded applications

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2 Author(s)
Min-Hwa Chi ; Adv. Technol. Group, Nat. Semicond. Corp., Santa Clara, CA, USA ; Bergemont, A.

Discusses a new single-poly flash memory cell structure on triple-well CMOS technology and new program/erase schemes with operating voltage not exceeding /spl plusmn/V/sub cc/. Conventional single-poly EPROM, although fully compatible with standard CMOS fabrication, suffers from high-voltage operation, slow programming, and incapability of electrical erase. This new flash cell and program/erase schemes are promising for low-voltage and low-power nonvolatile memory applications in CMOS mixed-signal circuits of system-on-a-chip.

Published in:

Device Research Conference Digest, 1997. 5th

Date of Conference:

23-25 June 1997