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Investigation of graphene piezoresistors for use as strain gauge sensors

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5 Author(s)
Chen, Xing ; MEMS and Nanotechnology Laboratory, School of Mechanical Systems Engineering, Chonnam National University, Gwangju, South Korea ; Zheng, Xiaohu ; Kim, Ji-Kwan ; Li, Xinxin
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Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1116/1.3660784 

The primary objective of this research is to fabricate a graphene-based piezoresistive strain gauge and characterize its sensitivity. The strain gauge consists of mechanically exfoliated graphene sheets and electrical electrodes located on a silicon wafer. Instead of using e-beam lithography, which is the most widely applied methods in experimental studies of graphene, a new fabrication method utilizing conventional photolithography was used to easily fabricate a new nanoelectromechanical system strain gauge. The proposed fabrication technique is easy and only requires a few types of microfabrication equipment, thereby opening up a new way to broadly spread and facilitate associated graphene research, especially for those laboratories with limited resources. To characterize the piezoresistive sensitivity of the graphene-based strain gauge, a strain-detection system built by an equivalent-stress macrocantilever was set up to generate mechanical bending strain where a calibrated commercial strain gauge was packaged to display the generated strain. Utilizing this measurement setup, the electrical properties of the graphene-based piezoresistive strain gauge were reliably investigated. A high gauge factor of ∼150 was experimentally measured with the graphene device, which promises a new strain gauge of high sensitivity.

Published in:

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures  (Volume:29 ,  Issue: 6 )

Date of Publication:

Nov 2011

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