Cart (Loading....) | Create Account
Close category search window
 

Optimal Cu buffer layer thickness for growing epitaxial Co overlayers on Si(111)7 × 7

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

4 Author(s)
Ivanov, Yu. P. ; School of Natural Science, Far Eastern Federal University, 690950 Vladivostok, Russia ; Ilin, A. I. ; Davydenko, A. V. ; Zotov, A. V.

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.3651598 

Using scanning tunneling microscopy, reflection high energy diffraction and magnetic optical Kerr effect measurements, growth mode and the magnetic properties of epitaxial Co films on Si(111) with epitaxial Cu(111) buffer layers of various thicknesses have been studied. The strained 3.5-monolayer-thick Cu/Si(111) film has been found to be an optimal buffer, in which case an almost ideal layer-by-layer like growth of Co is observed up to six Co monolayers, due to a negligible lattice mismatch. The coercivity of Co films grown in this layer-by-layer like fashion has been determined to be about 10 Oe, testifying to the high quality of the formed Co film and Co/Cu interface. Changeover of the Co film growth mode from layer-by-layer like to multilayer has been found to result in the transition of the film magnetic properties from isotropic to markedly uniaxially anisotropic.

Published in:

Journal of Applied Physics  (Volume:110 ,  Issue: 8 )

Date of Publication:

Oct 2011

Need Help?


IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.