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Extreme ultraviolet source at 6.7 nm based on a low-density plasma

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9 Author(s)
Higashiguchi, Takeshi ; Department of Advanced Interdisciplinary Sciences, Center for Optical Research & Education (CORE), and Optical Technology Innovation Center (OpTIC), Utsunomiya University, Yoto 7-1-2, Utsunomiya, Tochigi 321-8585 Japan ; Otsuka, Takamitsu ; Yugami, Noboru ; Jiang, Weihua
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We demonstrate an efficient extreme ultraviolet (EUV) source for operation at λ = 6.7 nm by optimizing the optical thickness of gadolinium (Gd) plasmas. Using low initial density Gd targets and dual laser pulse irradiation, we observed a maximum EUV conversion efficiency (CE) of 0.54% for 0.6% bandwidth (BW) (1.8% for 2% BW), which is 1.6 times larger than the 0.33% (0.6% BW) CE produced from a solid density target. Enhancement of the EUV CE by use of a low-density plasma is attributed to the reduction of self-absorption effects.

Published in:

Applied Physics Letters  (Volume:99 ,  Issue: 19 )