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Barrier height determination of silicide-silicon contact by hybrid density functional simulation

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2 Author(s)
Gao, Qun ; Department of Electrical and Computer Engineering, University of Florida, Gainesville, Florida 32611-6130, USA ; Guo, Jing

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.3657767 

Accurate prediction of the Schottky barrier heights (SBHs) from first principles is important for contact and device technologies. Ab initio simulations based on widely used local density approximation and generalized gradient approximation significantly underestimate the SBHs. By modeling CoSi2-Si and NiSi2-Si contacts using the Heyd-Scuseria-Ernzerhof (HSE) hybrid functional calculations, we demonstrate that HSE hybrid functional simulations can predict the SBHs in agreement with experiments. Furthermore, the effects of interfacial dopants and metal induced gap states are examined by ab initio hybrid functional simulations.

Published in:
Applied Physics Letters  (Volume:99 ,  Issue: 18 )

Date of Publication: Oct 2011

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