By Topic

Boosting performance of self-timed delay-insensitive bit parallel on-chip interconnects

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

6 Author(s)
Nigussie, E. ; Dept. of Inf. Technol., Univ. of Turku, Turku, Finland ; Tuuna, S. ; Plosila, J. ; Liljeberg, P.
more authors

The authors present a performance boosting technique with a better power efficiency for delay-insensitive on-chip interconnects. The increase in signal propagation delay uncertainty with technology scaling makes self-timed delay-insensitive on-chip interconnects the most appropriate alternative. However, achieving high-performance communication in self-timed delay-insensitive links is difficult, especially for large bit parallel transmission because of the time-consuming detection of each bit validity. The authors present a high-speed completion detection technique along with its circuit implementation and two on-chip interconnects which use the proposed completion detection circuit. The performance, power consumption, power efficiency and area of the presented on-chip interconnects are analysed and compared with the conventionally implemented delay-insensitive interconnects. For 64-bit parallel transmission, 2.07 and 1.72 times throughput improvement with 47 and 39% more power efficiency have been achieved for the two interconnects compared to their conventional counterparts. The interconnect circuits are designed and simulated using Cadence Analog Spectre and Hspice with 65 nm complementary metal-oxide semiconductor technology from STMicroelectronics.

Published in:

Circuits, Devices & Systems, IET  (Volume:5 ,  Issue: 6 )