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Characterization of Ti-O-N films deposited on Ti-Ta-Nb substrate by plasma laser deposition

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4 Author(s)
Vasile-Danut Cojocaru ; National Institute for Research and Development in Microtechnologies, Erou Iancu Nicolae 126A(32B), Bucharest, Romania ; Doina Raducanu ; Nicu Doinel Scarisoreanu ; Ion Cinca

In present days in-depth behaviour characterization of multifunctional deposited films for MEMS/BIO-MEMS applications, showed the need of adequate properties, in order to assure the demanded designed functions for envisaged applications, such as: physical, chemical, mechanical, tribological and biocompatible. The development of new materials for films deposition with high potential to be used in BIO-MEMS applications is a goal at national an international level. Recently, a new class of deposition materials consist in metal-oxy-nitrides Me-O-N (Me - transition metal) has been started to be investigated, because has been showed that the oxygen presence has as effect obtaining of mixture of specific properties for both nitrides (Me-N) and oxides (Me-O). A way to tailor the specific properties for deposited film consist in modifying the ratio O/N, in this way the deposited film specific properties are directed more towards to oxides/nitrides properties. In this paper partially data concerning O/N ratio influence upon films characteristics are presented.

Published in:

CAS 2011 Proceedings (2011 International Semiconductor Conference)  (Volume:2 )

Date of Conference:

17-19 Oct. 2011