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Modeling of plasma remediation of VOCs in dielectric barrier discharges

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2 Author(s)
Xu, X.P. ; Dept. of Electr. & Comput. Eng., Illinois Univ., Urbana, IL, USA ; Kushner, M.J.

Summary form only given, as follows. Since each year significant quantities of toxic wastes containing volatile organic compounds (VOCs) are produced by chemical and allied industries, destruction of these VOCs has become a major environmental concern. Dielectric barrier discharges (DBDs) are promising low cost plasma sources for destruction of the VOCs. The efficiency of plasma remediation depends on gas mixture, the dielectric constant and format of the voltage pulse. We have developed 1-d and 2-d plasma chemistry and hydrodynamic models to focus on the energy efficiency and optimum conditions for destruction of chlorinated hydrocarbons including CCl/sub 4/ and CHCI/sub 3/ which are widely used as industrial solvents. The plasma remediation model consists of circuit models, solution of Boltzmann's equation for the electron energy distribution, plasma chemistry modules, and solution of the compressible Navier Stokes equations. CCl/sub 4/ and CHCI/sub 3/ can be initially destroyed by dissociative-electron-attachment which requires different discharge conditions than for generation of radicals for chemical remediation. These different operating regions are discussed. We present a detailed description of the major plasma chemical pathways and discuss the effects of varying parameters, such as applied voltage, dielectric constant, gas mixture content in the gas stream, and temperature on the amount and energy efficiency of remediation.

Published in:

Plasma Science, 1997. IEEE Conference Record - Abstracts., 1997 IEEE International Conference on

Date of Conference:

19-22 May 1997

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