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Monte Carlo simulation and experimental study of an electron cyclotron resonance plasma for thin film deposition

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3 Author(s)
Koretzky, E. ; Polytech. Univ., Farmingdale, NY, USA ; Kuo, S.P. ; Kuo, S.C.

Summary form only given. Monte Carlo simulation of electron behavior in an ECR microwave discharge, maintained by the TM/sub 11/ mode of a cylindrical waveguide, has been performed. The results show that at low pressures (/spl sim/0.5 mtorr) the temperature of the tail portion of the EED exceeds 40 eV and the sheath potential is about -200 V. These results are about twice as high as the previous using the TM/sub 01/ mode. An ECR plasma source has been designed accordingly. A Langmuir probe is used to measure the characteristics of the plasma. Hydrogen mixed with 1% methane at a pressure of 0.5 mtorr is used as the background gas. The simulation and experimental results will be presented.

Published in:

Plasma Science, 1997. IEEE Conference Record - Abstracts., 1997 IEEE International Conference on

Date of Conference:

19-22 May 1997