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Summary form only given. Plasma processing equipment has become one of the most important tools used for microelectronics fabrication. The increasing complexity of microelectronics devices is making it imperative to develop a thorough understanding of this equipment. In order to accomplish this goal, a hierarchy of simulation tools have been developed at the University of Illinois in the recent years. These tool are centered around the Hybrid Plasma Equipment Model (HPEM), detailed plasma model. This paper gives an overview of the HPEM, its extensions and the variety of problems these tools can address.