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Simple ultraviolet-based soft-lithography process for fabrication of low-loss polymer polysiloxanes-based waveguides

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6 Author(s)
Teng, J. ; Sch. of Phys. & Eng., Henan Univ. of Sci. & Technol., Luoyang, China ; Yan, H. ; Li, L. ; Zhao, M.
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A simple ultraviolet (UV)-based soft-lithography process is used for fabrication of polymer polysiloxanes (PSQ-L) waveguides. The imprint process is first done on the cladding PSQ-LL layer and is followed by a spin-coating step to fill the imprinted features with core PSQ-LH layer material. The optical loss of the straight PSQ-L waveguides is characterised by the Fabry-Perot method for the first time. Even with non-polished facet of the waveguide, the Fabry-Perot resonance spectrum is obtained. An upper limit scattering loss of the waveguide is extracted to be less than 0.8-0.2-dB/cm for TE mode and 1.3-0.2-dB/cm for TM mode at 1550-nm. The fully transferred pattern and low scattering loss proves it to be an effective way to replicate low-loss polymer PSQ-L-based waveguides.

Published in:

Optoelectronics, IET  (Volume:5 ,  Issue: 6 )