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We present a vertical-silicon-nanowire-based p-type tunneling field-effect transistor (TFET) using CMOS-compatible process flow. Following our recently reported n-TFET , a low-temperature dopant segregation technique was employed on the source side to achieve steep dopant gradient, leading to excellent tunneling performance. The fabricated p-TFET devices demonstrate a subthreshold swing (SS) of 30 mV/decade averaged over a decade of drain current and an Ion/Ioff ratio of >; 105. Moreover, an SS of 50 mV/decade is maintained for three orders of drain current. This demonstration completes the complementary pair of TFETs to implement CMOS-like circuits.