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Application of advnced process control on mixed-product chemical mechanical polishing process

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4 Author(s)
Chien-Feng Wu ; Inst. of Electr. Control Eng., Nat. Chiao Tung Univ., Hsinchu, Taiwan ; Cheng-Hsien Chen ; Mui-Home Chen ; Cheng-Wenc Chen

This research developed a run-to-run (RtR) process control technique on the mix-product chemical mechanical polishing (CMP) process. The model of the mix-product CMP process was constructed by using analysis of variance and time series analysis. Then, it was transferred to the state space Torm and the extended Kalman filter was employed to estimate the disturbances and update the tool parameter simultaneously. Different methods including time series analysis, double exponentially weighted moving average (D-EWMA), time variant D-EWMA and the proposed method was carried out by CMP real data and the results demonstrated that the performance or the proposed method is better than others.

Published in:

Electronic and Mechanical Engineering and Information Technology (EMEIT), 2011 International Conference on  (Volume:4 )

Date of Conference:

12-14 Aug. 2011