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Amplitude mask patterned on an excimer laser mirror for high intensity writing of long period fibre gratings

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4 Author(s)
Patrick, H.J. ; Div. of Opt. Sci., Naval Res. Lab., Washington, DC, USA ; Askins, C.G. ; McElhanon, R.W. ; Friebele, E.J.

Masks have been produced for long period fibre grating fabrication from commercial dielectric laser mirrors. The masks, which were produced by direct patterning of a photoresist using an argon laser, can withstand in excess of 200 MJ/cm2 per 15 ns pulse of 248 nm laser light. The use of these masks decreased exposure times by 90%, and nearly doubled the attenuation (dB) of a long period grating produced by a given UV fluence compared to chrome-on-silica masks

Published in:

Electronics Letters  (Volume:33 ,  Issue: 13 )