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Novel fabrication technique for nanoscale hydrogen silsesquioxane structures using a direct printing technique

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4 Author(s)
Yang, Ki-Yeon ; Department of Materials Science and Engineering, Korea University, Seoul, 136-713, South Korea ; Oh, Sang-Chul ; Park, Hyungwon ; Heon Lee

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1116/1.3628585 

Hydrogen silsesquioxane (HSQ), a type of spin-on glass, is an attractive material for nanobio, semiconductor and photoelectronic applications because it can be transformed into SiO2 by a simple annealing process. Studies on the fabrication of nanosized structures are necessary for the simple and easy production of HSQ nanostructures because of their unique characteristics. In this study, a fabrication method was developed for HSQ nanostructures as small as 50 nm using a direct printing technique with a poly (dimethylsiloxane) (PDMS) mold. Using this technique, HSQ nanostructures can be fabricated on a curved substrate

Published in:

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures  (Volume:29 ,  Issue: 5 )

Date of Publication:

Sep 2011

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