Cart (Loading....) | Create Account
Close category search window
 

AC Bipolar Pulsed Power Supply for Reactive Magnetron Sputtering

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

7 Author(s)

This paper presents an ac bipolar pulsed power supply, which is used to drive a magnetron sputtering reactor operating under reactive atmosphere. The power supply was tested for the deposition of thin films of ZnO:Al on glass and plastic substrates. Voltage, current, and optical spectroscopy measurements were performed during the discharge. The electrical aspects of the ac bipolar pulsed magnetron discharge operating with reactive gases at pressures below 0.066 kPa are discussed. To characterize the power transferred to the plasma, electrical parameters are measured with calibrated current and voltage probes. The rate of deposition and their characteristics are also discussed.

Published in:

Plasma Science, IEEE Transactions on  (Volume:39 ,  Issue: 10 )

Date of Publication:

Oct. 2011

Need Help?


IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.