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"We need to develop a nanolithography-based mastering process that can be transferred to commercial mass production. By the way, it must be low cost so we shall use a visible light instead of an electron beam (e-beam) or extreme ultraviolet (EUV) as an exposure light source, and hence we might need to circumvent some laws of physics along the way." This was the challenge posed almost six years ago by Jau-Jiu Ju to his team working at the Electronics and Optoelectronics Laboratories (EOL) in Hsinchu, Taiwan. The EOL is a research center within the Industrial Technology Research Institute (ITRI).