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Niobium doped TiO2 thin films ((TiO2)1-x(Nb2O5)x, x=0, 0.2%, 0.4%, 0.6%, 0.8%) were prepared on ITO-coated substrates by sol-gel method and spin coating technology followed by rapid thermal annealing treatment (RTA). The effects of various processing parameters, including Nb content (x=0-0.8%) and annealing temperature, on the growth and properties of thin films were investigated. Structural characteristics by X-ray diffraction analysis indicated that the doping of Nb2O5 in the TiO2 without change the anatase structure of TiO2 thin films. The absorption coefficient shows energy gap were decreased with increasing Nb2O5 content from 3.29 eV for x=0 to 3.2 eV for x=0.8%. Doping TiO2 with Nb2O5 can lower its band gap and shift its optical response to the visible region. It should be effective as a visible-light-driven photocatalyst.