IEEE.org| IEEE Xplore Digital Library| IEEE Standards| IEEE Spectrum| More Sites

Cart (Loading....) | Create Account | 

Close category search window
Author Searchbeta |  Advanced Search  |  Preferences |  Search Tips  |  More Search Options  
 
Browse Conference Publications > VLSI Technology (VLSIT), 2011 ... Help

A highly manufacturable integration technology of 20nm generation 64Gb multi-level NAND flash memory

Full Text Sign-In or Purchase

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing! close button
puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

34 Author(s)
Keun Woo Lee ; R&D Div., Hynix Semicond. Inc., Icheon, South Korea ; Se Kyoung Choi ; Sung Jae Chung ; Hye Lyoung Lee
more authors

Multi-level NAND flash memories with a 20nm design rule have been successfully developed for the first time. A 20nm rule wordline (WL) and bitline (BL) direction have been realized by Spacer Patterning Technology (SPT) of ArF immersion lithography. Key integration technologies include WL airgap with separate gate etch process and optimized control gate (CG) poly deposition process. In addition, many physical and electrical challenges are successfully demonstrated to overcome scaling limit of 20nm technology.

Published in:
VLSI Technology (VLSIT), 2011 Symposium on

Date of Conference: 14-16 June 2011

Page(s):
70 - 71
ISSN :
0743-1562
Print ISBN:
978-1-4244-9949-6
INSPEC Accession Number:
12192430
Conference Location :
Honolulu, HI
Product Type:
Conference Publications

IEEE Account

Purchase Details

Profile Information

Need Help?


IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2013 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.