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Unsharp Masking Sharpening Detection via Overshoot Artifacts Analysis

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4 Author(s)
Gang Cao ; Inst. of Inf. Sci., Beijing Jiaotong Univ., Beijing, China ; Yao Zhao ; Rongrong Ni ; Kot, A.C.

In this letter, we propose a new method in detecting unsharp masking (USM) sharpening operation in digital images. Overshoot artifacts are found to occur around side-planar edges in the sharpened images. Such artifacts, measured by a sharpening detector, can serve as a rather unique feature for identifying the previous performance of sharpening operation. Test results on photograph images with regard to various sharpening operators show the effectiveness of our proposed method.

Published in:

Signal Processing Letters, IEEE  (Volume:18 ,  Issue: 10 )