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We propose the use of a high-κ spacer to improve the electrostatic integrity and, thereby, the scalability of silicon junctionless transistors (JLTs) for the first time. Using extensive simulations of n-channel JLTs, we demonstrate that the high-κ spacers improve the electrostatic integrity of JLTs at sub-22-nm gate lengths. Electric field that fringes through the high-κ spacer to the device layer on either sides of the gate results in an effective increase in electrical gate length in the off-state. However, the effective gate length is unaffected in the on-state. Hence, the off-state leakage current is reduced by several orders of magnitude with the use of a high-κ spacer with concomitent improvements in the subthreshold swing and drain-induced barrier lowering. A marginal improvement in the on-state current is observed with the use of the high-κ spacer, and this is related to the reduction in parasitic resistance in the silicon under the spacer due to fringe fields.