Cart (Loading....) | Create Account
Close category search window
 

High mobility material channel CMOS technologies based on heterogeneous integration

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

2 Author(s)
Takagi, S. ; Dept. of Electr. Eng. & Inf. Syst., Univ. of Tokyo, Tokyo, Japan ; Takenaka, M.

CMOS family utilizing III-V/Ge channels on Si substrates can be key devices for high performance and low power advanced LSIs in the future. The critical issues and the key technologies for realizing Ge/III-V-based channel MOSFETs on the Si platform have been addressed. While there are still several critical issues to be solved, recent progresses on the MOS interface control technologies, the Ge/III-V thin body channel formation techniques, the mobility booster technologies including surface orientation engineering and the S/D junction technologies on Ge MOSFETs are making Ge/III-V channel MOSFETs more promising for future applications to high performance and low power advanced LSIs. As a result, we can conclude that ultrathin-body-based Ge/III-V MOSFETs on the Si CMOS platform can be a strong candidate as the device structures under the 15 nm technology node and beyond.

Published in:

Junction Technology (IWJT), 2011 11th International Workshop on

Date of Conference:

9-10 June 2011

Need Help?


IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.