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2D photonic crystal TM polarizer fabricated by one-step combined nanoimprint and photolithography

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6 Author(s)
Choi, K.-H. ; Univ. of Texas at Dallas, Richardson, TX, USA ; Huh, J. ; Cui, Y. ; Ju, B.-K.
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Photonic crystal has been widely investigated since it has a great potential to manipulate the flow of light in ultra compact scale. 2D slab photonic crystals for telecommunication wavelengths (e.g., ~1550 nm) have multi-scale structures which are typically micron scale waveguides and deep sub-micron scale air-hole array. Several steps of nanolithography and photolithography are usually used for the fabrication of multi-scale photonic crystals. Such a multi-step lithography process increases fabrication complexity. In this work, we report one-step lithography process to pattern both micron and deep sub-micron features simultaneously using combined-nanoimprint-and-photolithography. As a demonstrator, a 2D silicon photonic crystal transverse magnetic (TM) polarizer was fabricated and characterized.

Published in:

Solid-State Sensors, Actuators and Microsystems Conference (TRANSDUCERS), 2011 16th International

Date of Conference:

5-9 June 2011

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