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Continuous photolithography system and technology for fiber substrate

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5 Author(s)
Y. Zhang ; NEDO BEANS Project, Macro BEANS Center, Tsukuba, Ibaraki, Japan ; J. Lu ; A. Ohtomo ; H. Mekaru
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This paper presents novel continuous photolithography technology and system as well for fiber substrate. The newly-developed system mainly consists of spray coating and three-dimensional (3D) UV exposure units. Thin and uniform resist film is successfully prepared on fiber substrates and thus the photolithography results were improved much. It is noteworthy that thin resist film could be formed on 125 μm-in-diameter fiber even without rotation, suggesting that the spray coating technology has attractive prospects. With the 3D photolithography system, fine patterns of resist down to 20 μm line width are successfully formed on the 125 μm-in-diameter fiber.

Published in:

2011 16th International Solid-State Sensors, Actuators and Microsystems Conference

Date of Conference:

5-9 June 2011