Referenced Items are not available for this document.
This paper presents novel continuous photolithography technology and system as well for fiber substrate. The newly-developed system mainly consists of spray coating and three-dimensional (3D) UV exposure units. Thin and uniform resist film is successfully prepared on fiber substrates and thus the photolithography results were improved much. It is noteworthy that thin resist film could be formed on 125 μm-in-diameter fiber even without rotation, suggesting that the spray coating technology has attractive prospects. With the 3D photolithography system, fine patterns of resist down to 20 μm line width are successfully formed on the 125 μm-in-diameter fiber.
Published in:
Solid-State Sensors, Actuators and Microsystems Conference (TRANSDUCERS), 2011 16th International
Date of Conference: 5-9 June 2011
- Page(s):
- 370 - 373
- ISSN :
- Pending
- Print ISBN:
- 978-1-4577-0157-3
- INSPEC Accession Number:
- 12169596
- Conference Location :
- Beijing
- Digital Object Identifier :
- 10.1109/TRANSDUCERS.2011.5969476
- Product Type:
- Conference Publications
About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies
A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2013 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.
