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A monolithic integration platform for silicon photonics

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6 Author(s)
Wang, Zhechao ; Sch. of ICT, R. Inst. of Technol. (Sweden), Kista, Sweden ; Junesand, C. ; Metaferia, W. ; Chen Hu
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A novel epitaxial lateral overgrowth (ELOG) technology-based monolithic integration platform for silicon photonics is demonstrated. High quality, defect-free InP ELOG mesa has been experimentally obtained on silicon by using hydride vapor phase epitaxy (HVPE). The proposed platform provides unique advantages for the realization of active devices on silicon.

Published in:

Information Photonics (IP), 2011 ICO International Conference on

Date of Conference:

18-20 May 2011