By Topic

Advanced overlay control in volume manufacturing

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$33 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

12 Author(s)
Timothy Wiltshire ; IBM Corporation, Hopewell Junction, New York, USA ; Christopher Ausschnitt ; Nelson Felix ; Emily Hwang
more authors

The work reviewed will describe a particular effort in the area of overlay matching based on the BaseLiner™ package marketed by ASML. BaseLiner relies on the concept of Scanner Baseline Constants (SBCs). Traditionally, optical lithography systems are controlled by many numerical parameters known as Machine Constants (MCs). MCs are typically generated by a lithography system during in situ or other system based tests that generate and optimize the MCs for a very specific test condition set. The concept of SBCs introduces a “middle layer” of offsets that forces tools to be closely matched to one another under general lithography conditions, not just the specific test conditions used for MC generation. The methodology is designed to handle specific product layouts.

Published in:

2011 IEEE/SEMI Advanced Semiconductor Manufacturing Conference

Date of Conference:

16-18 May 2011