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Applications of a theoretical model for line width control in photoresists sensitised by a laser beam

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4 Author(s)
Christophe, E.S. ; IXL, Bordeaux I Univ., Talence ; Fremont, H. ; N'Kaoua, G. ; Danto, Y.

Various applications are presented of a lithography machine designed for laser direct patterning of metallisation in MCM or ASICs. The experimental setup conditions are largely simplified by theoretical calculation of the line width etched in the photoresist after its exposure and development

Published in:

Electronics Letters  (Volume:33 ,  Issue: 12 )