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We derived an analytical model for the junctionless double-gate metal-oxide-semiconductor field-effect transistor (DG MOSFET) device, the principle of which has been recently demonstrated. Despite some similarities with classical junction-based DG MOSFETs, the charge-potential relationships are quite different and cannot be merely mapped on existing multigate formalisms. This is particularly true for the technological parameters of interest where reported doping densities exceed 1019 cm-3 for 10- and 20-nm silicon channel thicknesses. Assessment of the model with numerical simulations confirms its validity for all regions of operation, i.e., from deep depletion to accumulation and from linear to saturation.