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The authors report on the chemical durability and oxidation resistance of Ru/Si, Ru/B, Ru/C, and Ru capping layers on the extreme ultraviolet (EUV) reflector surface. Surface etching and changes in the oxidation state were probed with x-ray photoelectron spectroscopy. The changes in surface morphology and roughness are characterized using scanning electron microscopy and atomic force microscopy. Out of four different capping layers, Ru/Si layers exhibited the least surface oxidation after oxygen plasma and UV/ozone treatment, indicating a superior oxidation resistance. The authors found that the reflectivity of the Ru/Si capped reflector is similar to that of a bare Ru capped reflector. This study suggests that a Ru/Si layer can be an excellent capping layer for the EUV reflector.
Published in:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
(Volume:29
,
Issue:
4
)
Date of Publication: Jul 2011
- Page(s):
- 041602 - 041602-5
- ISSN :
- 1071-1023
- Digital Object Identifier :
- 10.1116/1.3596560
- Product Type:
- Journals & Magazines
- Date of Current Version :
- 09 June 2011
- Issue Date :
- Jul 2011
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