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High-speed and high-power GaInAsP/InP junction field-effect transistor with submicron gate

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5 Author(s)
Furutsu, M. ; Fujitsu Labs. Ltd., Kanagawa ; Sudo, H. ; Soda, H. ; Ishikawa, H.
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Depletion-mode GaInAsP/InP junction field-effect transistors have been fabricated on Fe-doped semi-insulating InP substrates using liquid-phase epitaxial growth techniques. The authors achieved transconductance of 24 mS (160 mS/mm), drain-source saturation current at an on gate bias of 486 mA/mm and current cutoff frequency of 18.8 GHz using a GaInAsP channel layer owing to the gate length reduction

Published in:
Electronics Letters  (Volume:24 ,  Issue: 12 )

Date of Publication: 9 Jun 1988

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