Spatially resolved determination of loss in silicon nanophotonic waveguides using optical frequency-domain reflectometry is reported. Taking measurements from either side of a waveguide, discriminating loss from non-uniform scattering properties is demonstrated. This technique is fast, nondestructive and does not require any knowledge about the launching efficiency.
Published in:
Electronics Letters
(Volume:47
,
Issue:
11
)
Date of Publication: May 26 2011