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Spatially resolved loss measurement in silicon waveguides using optical frequency-domain reflectometry

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3 Author(s)
Müller, J. ; E-11 Optische Kommunikationstechnik, Tech. Univ. Hamburg-Harburg, Hamburg, Germany ; Krause, M. ; Brinkmeyer, E.

Spatially resolved determination of loss in silicon nanophotonic waveguides using optical frequency-domain reflectometry is reported. Taking measurements from either side of a waveguide, discriminating loss from non-uniform scattering properties is demonstrated. This technique is fast, nondestructive and does not require any knowledge about the launching efficiency.

Published in:
Electronics Letters  (Volume:47 ,  Issue: 11 )

Date of Publication: May 26 2011

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