A novel electrical layer-selection method in a bit-line stacked 3-D nand memory array is proposed. The stacked layers are selected by using multiple source select lines with erased cells in a layer. The operation scheme and simulation results for the electrical layer selection are discussed. An etch-through-spacer technique is developed to form a terraced body for a vertical contact process.
Published in:
Electron Devices, IEEE Transactions on
(Volume:58
,
Issue:
7
)
Date of Publication: July 2011