Cart (Loading....) | Create Account
Close category search window

Effects of mask absorber thickness on printability in EUV lithography with high resolution resist

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

4 Author(s)
Kamo, Takashi ; MIRAI - Semiconductor Leading Edge Technologies, Inc. (Selete), 16-1 Onogawa, Tsukuba, Ibaraki, 305-8569, Japan ; Aoyama, Hajime ; Tanaka, Toshihiko ; Suga, Osamu

The effects of mask absorber thickness on printability in EUV lithography was studied from the viewpoint of lithographic requirements which can give high imaging contrast and reduce shadowing effect. From lithography simulation, optimum thickness range of mask absorber (LR-TaBN) for exposure latitude was predicted, and the effect of absorber thickness on MEF and H-V (Horizontal - Vertical) printed CD difference was determined using resist blur model. From printability experiments with a Small Field Exposure Tool (SFET) and with high resolution resist, optimum thickness of LR-TaBN absorber was demonstrated. When thinner absorber mask is employed in EUVL for ULSI chip production, it becomes necessary to introduce EUV light shield area in order to suppress the leakage of EUV light from neighboring exposure shots. Resist pattern CD change from the neighboring exposure shots was estimated by lithography simulation.

Published in:

Mask and Lithography Conference (EMLC), 2009 25th European

Date of Conference:

12-15 Jan. 2009

Need Help?

IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.