By Topic

High-Performance Microwave Gate-Recessed AlGaN/AlN/GaN MOS-HEMT With 73% Power-Added Efficiency

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

8 Author(s)
Hao, Yue ; Key Lab. of Wide Band-Gap Semicond. Mater. & Devices, Xidian Univ., Xi''an, China ; Ling Yang ; Xiaohua Ma ; Jigang Ma
more authors

Gate-recessed AlGaN/AlN/GaN metal-oxide-semiconductor heterostructure high-mobility transistors (MOS-HEMTs) on SiC substrate are fabricated. The device with a gate length of 0.6 μm and a gate periphery of 100 μm exhibits a maximum dc drain current density of 1.59 A/mm at VGS = 3 V with an extrinsic transconductance (gm) of 374 mS/mm. An extrinsic current gain cutoff frequency (fT) of 19 GHz and a maximum oscillation frequency (fmax) of 50 GHz are deduced from S-parameter measurements. The output power density is 13 W/mm, and the associated power-added efficiency is 73% at 4-GHz frequency and 45-V drain bias. The power performance is comparable to state-of-the art AlGaN/GaN HEMTs, which demonstrates the great potential of gate-recessed MOS-HEMTs as a very promising alternative to GaN HEMTs.

Published in:

Electron Device Letters, IEEE  (Volume:32 ,  Issue: 5 )