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A novel electron beam-inspection technique for high-impedance contact plugs

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7 Author(s)
Ominami, Yusuke ; Hitachi High-Technol. Corp., Hitachinaka, Japan ; Tsuno, N. ; Nozoe, M. ; Oh, J.H.
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We here present a novel electron beam inspection technique for non-annealed high impedance poly-Si plugs. At this new method, interval time between each electron beam scan is varied to enhance the difference of surface voltage of normal plug, disconnected plug and SiO2. Based on experimental results using our experimental tool with the new interval scan technique, contrast between SiO2 and poly-Si plug, between normal plug and disconnected plug have been dramatically enhanced.

Published in:

Semiconductor Manufacturing (ISSM), 2010 International Symposium on

Date of Conference:

18-20 Oct. 2010

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