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The advanced EPD (Endpoint Detection) tool was developed originally and its application for NF3 remote plasma cleaning was reported in ISSM2008. In this paper, we applied the tool to ClF3 gas cleaning and successfully detected the endpoint. The validity of the endpoint was verified by photo luminescence measurement and dependence on deposition thickness. Furthermore, ClF3 gas cleaning condition was optimized for mass production WSi (tungsten silicide) CVD with the tool.