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Optimization of CVD ClF3 non-plasma cleaning condition with advanced endpoint detection tool

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6 Author(s)
Hamaguchi, Y. ; Renesas Electron. Corp., Hitachinaka, Japan ; Fujii, K. ; Shirakawa, K. ; Hanazaki, M.
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The advanced EPD (Endpoint Detection) tool was developed originally and its application for NF3 remote plasma cleaning was reported in ISSM2008. In this paper, we applied the tool to ClF3 gas cleaning and successfully detected the endpoint. The validity of the endpoint was verified by photo luminescence measurement and dependence on deposition thickness. Furthermore, ClF3 gas cleaning condition was optimized for mass production WSi (tungsten silicide) CVD with the tool.

Published in:
Semiconductor Manufacturing (ISSM), 2010 International Symposium on

Date of Conference: 18-20 Oct. 2010

Page(s):
1 - 4
ISSN :
1523-553X
E-ISBN :
978-4-9904138-3-5
Print ISBN:
978-1-4577-0392-8
INSPEC Accession Number:
11945545
Conference Location :
Tokyo
Product Type:
Conference Publications

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